Paper
18 October 2004 Effect of silicon anisotropy on mirror substrate design
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Abstract
Single-crystal silicon is one of the substrate materials often used for x-ray optical components, such as mirrors and monochromators. Silicon crystal is elastically anisotropic, mechanical properties are direction dependent. Because anisotropic analysis is complicated, isotropic approximation is commonly used in the design of optical substrates. This approximation is satisfactory in most cases. However, a full anisotropic analysis is required to precisely characterize the performance of optical substrates or determine the effect of anisotropy. In this paper, single-crystal-silicon anisotropy and its effects on deformation of bendable optics are discussed. The resulting anticlastic bending is described, and a complete numerical solution as well as approximate analytical formulations, is provided. Anisotropy can be used advantageously to accentuate anticlastic bending.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yaming Li and Ali M. Khounsary "Effect of silicon anisotropy on mirror substrate design", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.561438
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Cited by 1 scholarly publication.
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KEYWORDS
Crystals

Anisotropy

Silicon

X-ray optics

X-rays

Optical design

Mirrors

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