Developments in energetic processes for optical coating applications

Michael L. Fulton

doi:10.1117/12.555418

29 September 2004 Developments in energetic processes for optical coating applications

Michael L. Fulton

Proceedings Volume 5527, Advances in Thin Film Coatings for Optical Applications; (2004) https://doi.org/10.1117/12.555418
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Energetic process development in the production of optical coatings has progressed significantly over the last two decades, permitting the practitioner of thin film coating depositions a wide choice of deposition parameters. Primarily, a series of important advances has occurred in the nearly ubiquitous use of Ion Assisted Deposition (IAD) for the production of high performance optical coatings. Progressing from the rudimentary use of ionized gas technology for pre-cleaning substrates, to the advanced IAD produced telecom filters (DWDM), energetic processes now play a vital role in most optical coating production. The advances in IAD technology culminate in the development of stable and durable thin films for a wide variety of stringent spectral specifications from the UV to the Far IR. The technical progression from IAD use in either sputtered or physical vapor deposition (PVD) processes to the development of Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD) technology for applications from temperature-sensitive optics to future space coatings will be discussed.

Citation Download Citation

Michael L. Fulton "Developments in energetic processes for optical coating applications", Proc. SPIE 5527, Advances in Thin Film Coatings for Optical Applications, (29 September 2004); https://doi.org/10.1117/12.555418

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