A new simulated annealing algorithm applied to the design of diffractive optical elements used in uniform illumination

Hongliang Liu; Yiqiong Zhao; Yong-Ping Li

doi:10.1117/12.559028

29 September 2004 A new simulated annealing algorithm applied to the design of diffractive optical elements used in uniform illumination

Hongliang Liu, Yiqiong Zhao, Yong-Ping Li

Author Affiliations +

Proceedings Volume 5525, Laser Beam Shaping V; (2004) https://doi.org/10.1117/12.559028
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

This paper describes a fast simulation annealing algorithm for the optimum design and applies to beam shaping by diffractive optical elements. The algorithm introduced the corresponding utilities function, and used Tsallis statistic for optimum design. The simulated results show that to converge the incident energy into the desired region with the same mean square error, our method only cost 1% percent of time that needed by the traditional SA. This algorithm brings forward a new and fast method for the design of Diffractive Optical Elements, and potentially for other optimization problems.

Citation Download Citation

Hongliang Liu, Yiqiong Zhao, and Yong-Ping Li "A new simulated annealing algorithm applied to the design of diffractive optical elements used in uniform illumination", Proc. SPIE 5525, Laser Beam Shaping V, (29 September 2004); https://doi.org/10.1117/12.559028

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