The polyimides photoresist for multilevel-interconnect VLSI technology

Nikolay G. Savinskii

doi:10.1117/12.557330

28 May 2004 The polyimides photoresist for multilevel-interconnect VLSI technology

Nikolay G. Savinskii

Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.557330
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation

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Nikolay G. Savinskii "The polyimides photoresist for multilevel-interconnect VLSI technology", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.557330

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