PMMA and polystyrene films modification under ion implantation studied by spectroscopic ellipsometry

A. V. Leontyev; V. I. Kovalev; A. V. Khomich; Fadei F. Komarov; V. V. Grigoryev; A. S. Kamishan

doi:10.1117/12.557303

28 May 2004 PMMA and polystyrene films modification under ion implantation studied by spectroscopic ellipsometry

A. V. Leontyev, V. I. Kovalev, A. V. Khomich, Fadei F. Komarov, V. V. Grigoryev, A. S. Kamishan

Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.557303
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation

Abstract

We have applied spectroscopic ellipsometry with binary polarization modulation to study the refractive index n(λ) and extinction coefficient k(λ) spectra of as-deposited and irradiated with nitrogen ions polymethylmethacrylate (PMMA) and polystyrene (PS) films in 300-1030 nm range. The results of performed investigation confirmed the possibility and estimate restrictions of the ion implantation for local change the refractive index of polymeric materials.

Citation Download Citation

A. V. Leontyev, V. I. Kovalev, A. V. Khomich, Fadei F. Komarov, V. V. Grigoryev, and A. S. Kamishan "PMMA and polystyrene films modification under ion implantation studied by spectroscopic ellipsometry", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.557303

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