PVD fault detection using disparate integrated data sources

Alan F. Krauss

doi:10.1117/12.540790

29 April 2004 PVD fault detection using disparate integrated data sources

Alan F. Krauss

Proceedings Volume 5378, Data Analysis and Modeling for Process Control; (2004) https://doi.org/10.1117/12.540790
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

In this paper, sensor data pertaining to plasma sputtering is examined. A sensor system monitoring power supply signals and detecting arcs was integrated with manufacturing equipment and data collected. In-situ measurements from the sensors correlate with post-process yield metrology, providing a mechanism for improved process control. Furthermore, from the rich set of data streaming from the sensors various classes of faults can be diagnosed. An error calculation and variable transformation methodology is presented so that classes of faults may be discriminated from one another.

Citation Download Citation

Alan F. Krauss "PVD fault detection using disparate integrated data sources", Proc. SPIE 5378, Data Analysis and Modeling for Process Control, (29 April 2004); https://doi.org/10.1117/12.540790

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