Paper
28 May 2004 Random aberration and local flare
Masato Shibuya, Hiromi Ezaki, Toshihumi Fukui, Nobuaki Watanabe, Akira Nishikata
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Abstract
Recently, in optical lithography, extremely small wavefront aberration has been required and the fine undulation of wave aberration has been aggressively discussed. Since CD(pattern width) variation of image depends on the local Cr density of mask, it has been regarded that the fine undulation of wavefront aberration scatters or diffracts light and causes local flare. However we think that the physical origin of local flare and the definition of fine undulation are not so clear. In this paper, we categorize wavefront aberration into figure aberration and random aberration. Therefore the concept of random aberration is useful to not only understand the local flare but also evaluate the fine undulation of wavefront aberration.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masato Shibuya, Hiromi Ezaki, Toshihumi Fukui, Nobuaki Watanabe, and Akira Nishikata "Random aberration and local flare", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.533979
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Cited by 7 scholarly publications.
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KEYWORDS
Wavefront aberrations

Wavefronts

Projection systems

Optical lithography

Chromium

Critical dimension metrology

Light scattering

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