Subsurface defects in silica detected by using cathodoluminescence and trapping of electrical charges measurements (Best Poster Presentation)

Janick Bigarre

doi:10.1117/12.524544

10 June 2004 Subsurface defects in silica detected by using cathodoluminescence and trapping of electrical charges measurements (Best Poster Presentation)

Janick Bigarre

Author Affiliations +

Proceedings Volume 5273, Laser-Induced Damage in Optical Materials: 2003; (2004) https://doi.org/10.1117/12.524544
Event: XXXV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2003, Boulder, Colorado, United States

Abstract

Polishing of optical components produces defects in the subsurface resulting in a decrease in their performance. These defects can be large, like cracks, but also punctual, like oxygen vacancies or non-bridging bonds. Under electronic excitation, punctual defects can produce luminescence (also called cathodoluminescence) and/or can trap electrical charges. In a first work, we have shown that the cathodoluminescence technique is a good way to detect punctual defects (color centers) in silica. In this work, we have improved our cathodoluminescence technique in order to measure the depth profiling of color centers. We have also used the “Charge Contrast Imaging” technique in environmental SEM to observe directly sub-surface scratches generated by polishing.

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Janick Bigarre "Subsurface defects in silica detected by using cathodoluminescence and trapping of electrical charges measurements (Best Poster Presentation)", Proc. SPIE 5273, Laser-Induced Damage in Optical Materials: 2003, (10 June 2004); https://doi.org/10.1117/12.524544

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