Paper
25 February 2004 Characterization of CaF2 substrates for VUV fluoride coatings
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Abstract
CaF2 has become the most important substrate for vacuum ultraviolet (VUV) optical coatings. The popularity of CaF2 relies on its transparency range, which extends down to 120 nm. A major drawback of the material is, however, its mechanical softness. Hence careful assessment of the surface quality is necessary in order to obtain low loss components. By combining roughness data from Nomarski Microscopy and Atomic Force Microscopy (AFM) measurements with total and angle resolved scattering measurements at 157 nm scatter losses due to interface roughness as well as bulk inhomogeneities are being studied. Measured losses are furthermore compared with theoretically predicted results. Results are also presented on VUV coatings. The question of the coupling between the substrate surface finishing quality and the optical properties of the coatings is specially addressed.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Annette Hultaker, Stefan Gliech, Henning Gessner, and Angela Duparre "Characterization of CaF2 substrates for VUV fluoride coatings", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.512691
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KEYWORDS
Scattering

Vacuum ultraviolet

Atomic force microscopy

Optical coatings

Scatter measurement

Light scattering

Polishing

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