Paper
18 February 2004 Ion implanted integrated optics (I3O) technology for planar lightwave circuits (PLCs) fabrication
Emmanuel Drouard, Ludovic Escoubas, Francois Flory, Stephane Tisserand, Laurent Roux
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Abstract
The I3O technology based on Titanium ion implantation in silica is proposed for the fabrication of passive compact PLC devices. It is demonstrated that the guided field can be easily tailored to fit standard fibers or can be compatible with the use of bent waveguides having a small radius of curvature.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Emmanuel Drouard, Ludovic Escoubas, Francois Flory, Stephane Tisserand, and Laurent Roux "Ion implanted integrated optics (I3O) technology for planar lightwave circuits (PLCs) fabrication", Proc. SPIE 5249, Optical Design and Engineering, (18 February 2004); https://doi.org/10.1117/12.512714
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KEYWORDS
Refractive index

Waveguides

Titanium

Silica

Ions

Integrated optics

Photonic integrated circuits

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