Deposition parameters influences in pulsed laser deposition by plume reflection

Aurelian Marcu; Constantin Grigoriu; Weihua Jiang; Kiyoshi Yatsui

doi:10.1117/12.520070

30 September 2003 Deposition parameters influences in pulsed laser deposition by plume reflection

Aurelian Marcu, Constantin Grigoriu, Weihua Jiang, Kiyoshi Yatsui

Proceedings Volume 5227, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies; (2003) https://doi.org/10.1117/12.520070
Event: 2003 Chapter books, 2003, Bellingham, WA, United States

Abstract

Pulsed laser deposition (PLD) is widely used to prepare various kinds of thin films. From many experimental results the film surface has been found to be strongly affected by so-called droplets, which are relatively large target material particles in solid or liquid state carried with the plume. In order to satisfy both purposes of high deposition rate and good quality by the PLD, we have investigated the plume reflection process from the viewpoint to avoid the big particles deposited on the substrate. In the present paper we investigate the influences of the system parameters on surface thin film quality and the deposition rate. Some optimization proposals are also included for this deposition technique.

Citation Download Citation

Aurelian Marcu, Constantin Grigoriu, Weihua Jiang, and Kiyoshi Yatsui "Deposition parameters influences in pulsed laser deposition by plume reflection", Proc. SPIE 5227, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies, (30 September 2003); https://doi.org/10.1117/12.520070

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