Paper
7 January 2004 Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography
Alexander A. Andreev, Jiri Limpouch, N. B. Voznesensky, Alexander P. Zhevlakov, Vladimir E. Yashin
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Abstract
The advantages of droplet and claster Li-contained targets for debris free EUV generation are estimated on base of analytical modeling and simulation. Conversion efficiency of laser energy into EUV energy from such targets is found to reach a few percents. The laser prepulse is proposed to enhance the laser energy conversion into emission at wavelength of 13.5 nm.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alexander A. Andreev, Jiri Limpouch, N. B. Voznesensky, Alexander P. Zhevlakov, and Vladimir E. Yashin "Enhancement of laser/EUV conversion by shaped laser pulse interacting with Li-contained targets for EUV lithography", Proc. SPIE 5196, Laser-Generated and Other Laboratory X-Ray and EUV Sources, Optics, and Applications, (7 January 2004); https://doi.org/10.1117/12.512456
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CITATIONS
Cited by 3 scholarly publications and 34 patents.
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KEYWORDS
Extreme ultraviolet

Pulsed laser operation

Plasma

Mirrors

Picosecond phenomena

Lithium

Optical amplifiers

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