Paper
13 January 2004 Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL
Katsura Otaki, Yucong Zhu, Mikihiko Ishii, Shigeru Nakayama, Katsuhiko Murakami, Takashi Gemma
Author Affiliations +
Abstract
In visible-light point diffraction interferometer (PDI), in order to achieve measurement error <0.1 - 0.2 nm rms, wavefront irregularity from the pinhole must be supressed as 0.05 - 0.1 nm rms in designing. It is so difficult to execute such high accurate (10-4λ) simulation because the numerical electromagnetic simulation shows slow convergence in the visible-region. We discussed this problem by using 2D-model and found simulation conditions to obtain significant results. By using the simulator, several kind of systematic erros have been analyzed and optimized.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Katsura Otaki, Yucong Zhu, Mikihiko Ishii, Shigeru Nakayama, Katsuhiko Murakami, and Takashi Gemma "Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.507046
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Cited by 17 scholarly publications.
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KEYWORDS
Wavefronts

Mirrors

Extreme ultraviolet lithography

Point diffraction interferometers

Diffraction

Error analysis

Numerical simulations

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