High-performance multilayer coatings for EUV lithography

Eberhard Spiller

doi:10.1117/12.507237

13 January 2004 High-performance multilayer coatings for EUV lithography

Eberhard Spiller

Proceedings Volume 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications; (2004) https://doi.org/10.1117/12.507237
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

We review the specification for the coatings in steppers for extreme ultraviolet (EUV) lithography and discuss the deposition methods that have produced such coatings. Thermal deposition by electron beam, magnetron sputtering, and ion beam deposition have all been able to achieve the requirements for future EUV optics. Ion beam sputtering has produced coatings with very few defects and can smooth substrate roughness and mitigate the effects of substrate defects.

Citation Download Citation

Eberhard Spiller "High-performance multilayer coatings for EUV lithography", Proc. SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications, (13 January 2004); https://doi.org/10.1117/12.507237

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