New solutions to realize complex optical systems by a combination of diffractive and refractive optical components

Robert Brunner; Reinhard Steiner; Hans-Juergen Dobschal; Dietrich Martin; Matthias Burkhardt; Michael Helgert

doi:10.1117/12.509459

3 November 2003 New solutions to realize complex optical systems by a combination of diffractive and refractive optical components

Robert Brunner, Reinhard Steiner, Hans-Juergen Dobschal, Dietrich Martin, Matthias Burkhardt, Michael Helgert

Author Affiliations +

Proceedings Volume 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II; (2003) https://doi.org/10.1117/12.509459
Event: Optical Science and Technology, SPIE's 48th Annual Meeting, 2003, San Diego, California, United States

Abstract

Diffractive optical elements (DOEs) have a great potential in the complete or partial substitution of refractive or reflective optical elements in imaging systems. The greater design flexibility compared to an all-refractive/reflective solution allows a more convenient realization of the optical systems and additionally opens up new possibilities for optimizing the performance or compactness. To demonstrate the opportunities of the hybrid optical concept we discuss different imaging systems for various applications. We present the lens design of a hybrid microscope objective which is especially applicable for wafer inspection technologies. Meeting the requirements for such a system used in the deep-UV regime (248 nm) is very challenging. The short wavelength limits the material selection and demands cement free optical groups. The additional requirement of an autofocus system, working at a wavelength in the near infrared region, is fulfilled by the special combination of two selected and adjusted DOEs. Furthermore, we discuss the opportunities of the hybrid concept c of a slit lamp used for ophthalmologic examinations. The DOEs are the basic elements of this hybrid concept. We demonstrate that holographic lithography is an appropriate technology to realize a wide variety of elements with different profile geometries. We address in particular the additional possibilities of an UV-laser system as an exposure tool. Additionally to the high spatial frequencies, the 266 nm exposure wavelength allows the use of novel photo resists with advantageous development behavior.

Citation Download Citation

Robert Brunner, Reinhard Steiner, Hans-Juergen Dobschal, Dietrich Martin, Matthias Burkhardt, and Michael Helgert "New solutions to realize complex optical systems by a combination of diffractive and refractive optical components", Proc. SPIE 5183, Lithographic and Micromachining Techniques for Optical Component Fabrication II, (3 November 2003); https://doi.org/10.1117/12.509459

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