Multiloop photolithography control using hierarchical context information for APC models

John D. Stuber

doi:10.1117/12.485309

1 July 2003 Multiloop photolithography control using hierarchical context information for APC models

John D. Stuber

Proceedings Volume 5044, Advanced Process Control and Automation; (2003) https://doi.org/10.1117/12.485309
Event: Advanced Microelectronic Manufacturing, 2003, Santa Clara, CA, United States

Abstract

Automated process control loops running in semiconductor manufacturing facilities must be able to compensate for machine variations as well as identify differences between products. With a number of exposure tools, pattern levels, and active devices manufactured in a typical ASIC fab, for photo APC system must maintain thousands of control loops. Control loop context information in TI's Semiconductor Manufacturing System (SMS) is defined in a hierarchal fashion which allows default values in a manufacturing specification to be overridden for particular products or lots. ProcessWORKS APC software automatically adds new control loops for new devices and pattern levels to a defined model structure. This system scales well and supports hundreds of thousands of control loops from a single database server in TI fabs. Application of product specific control systems for alignment and exposure control has provided increased exposure capacity due to decreased reworks and setup time, a substantial reduction in engineering maintenance and improved process capability. The APC system has evolved into a requirement for leading edge photolithography processes in Texas Instruments.

Citation Download Citation

John D. Stuber "Multiloop photolithography control using hierarchical context information for APC models", Proc. SPIE 5044, Advanced Process Control and Automation, (1 July 2003); https://doi.org/10.1117/12.485309

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