Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito; Toru Suzuki; Masaya Yoshino; Osamu Wakabayashi; Takashi Matsunaga; Junichi Fujimoto; Kouji Kakizaki; Taku Yamazaki; Toyoharu Inoue; Katsutomo Terashima; Tatsuo Enami; Hirotoshi Inoue; Akira Sumitani; Hitoshi Tomaru; Hakaru Mizoguchi

doi:10.1117/12.485386

26 June 2003 Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485386
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

193-nm lithography is going to move from pre-production phase to mass production phase and its target node become narrowing from 90 nm to 65 nm. In these situations, the laser manufacture needs to provide the high durable ArF excimer laser, which has superior spectrum performance. Gigaphoton has already introduced 4 kHz ArF laser (model G41A) to 193-nm lithography market, which produce 20 W and spectrum bandwidth of 0.35 pm (FWHM). G41A has showed high reliability and long lifetime over 5 billion pulses. In this paper, we report on the 4 kHz ArF excimer laser for mass production, model G42A, which has 20 W, spectral bandwidth less than 0.3 pm (FWHM) and a spectral purity less than 0.75 pm (E95).

Citation Download Citation

Takashi Saito, Toru Suzuki, Masaya Yoshino, Osamu Wakabayashi, Takashi Matsunaga, Junichi Fujimoto, Kouji Kakizaki, Taku Yamazaki, Toyoharu Inoue, Katsutomo Terashima, Tatsuo Enami, Hirotoshi Inoue, Akira Sumitani, Hitoshi Tomaru, and Hakaru Mizoguchi "Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485386

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available