Imaging performance extendibility

Jacek K. Tyminski; Steve D. Slonaker

doi:10.1117/12.485446

26 June 2003 Imaging performance extendibility

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485446
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Integrated circuits patterning faces escalating demands challenging the fundamental constraints of the photolithography tools. The challenge is to qualify patterning tools beyond their design objectives, to extend their use for the future manufacturing requirements. To address these challenges, we have adopted a three-step approach: 1) selection of the patterning strategies appropriate for a given set of design rules, 2) projection tool selection to match its capabilities with the process control requirements, and 3) tool’s fine-tuning to maximize patterning process latitude. Step 1 is customary exposure strategy optimization. Steps 2 and 3 go beyond common practice. These two steps rely on aberration residue data obtained by in-situ phase measuring interferometer. The comprehensive, three-step strategy involves all of the key factors impacting the imaging control of critical patterns. In this paper we present the key elements of the patterning strategy and projection lens optimization. We show an example illustrating the three steps of process and tool qualification for aggressive, sub-wavelength design rules. The example presents selection of optimum patterning strategy, the patterning tool selection based on their aberration residuum, and the projection lens residual aberration fine-tuning. The patterning approach resulting from the methodology presented here is compatible with IC manufacturing environment. The approach extends the use of the imaging tools beyond their design objective.

Citation Download Citation

Jacek K. Tyminski and Steve D. Slonaker "Imaging performance extendibility", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485446

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available