Detection of actual focus variations by focus automatic measurement

Daigo Hoshino; Takashi Yamauchi; Akira Watanabe; Toshio Onodera; Hidehiro Higashino

doi:10.1117/12.485353

26 June 2003 Detection of actual focus variations by focus automatic measurement

Daigo Hoshino, Takashi Yamauchi, Akira Watanabe, Toshio Onodera, Hidehiro Higashino

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485353
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We developed a new focus monitoring method that is simple yet highly accurate. We used simple measurement tools: a conventional binary mask and an optical overlay inspection machine. Our method was sufficiently precise to detect sub-100nm focus errors, and we demonstrated that it had high focus sensitivity under various illuminations (NA, σ, and illumination aperture). We measured actual focus errors by KrF scanner processing and determined the extent of each, i.e., field curvature/astigmatism, wafer topography, and best focus stability.

Citation Download Citation

Daigo Hoshino, Takashi Yamauchi, Akira Watanabe, Toshio Onodera, and Hidehiro Higashino "Detection of actual focus variations by focus automatic measurement", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485353

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