Deep-UV liquid immersion mastering of high-density optical discs

Helmar van Santen; Jaap H. M. Neijzen

doi:10.1117/12.513463

26 June 2003 Deep-UV liquid immersion mastering of high-density optical discs

Helmar van Santen, Jaap H. M. Neijzen

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.513463
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A water immersion technique has been developed to increase the numerical aperture (NA) of a 257 nm optical disc mastering system from 0.9 to 1.2. The developed system is capable of performing point exposures on a rotating disc at scanning velocities of more than 5 m/s. Gas inclusion in the immersion liquid, either from the photo-resist or through the dynamic movement of the substrate could be avoided. Furthermore, unwanted mechanical disturbances were sufficiently suppressed. Contamination of the photo-resist was avoided through careful handling of the water that was applied as immersion liquid. The resulting resolution enhancement was demonstrated in grooves. In 25 nm Novolac type resist, 70 nm wide grooves were written with liquid immersion, compared to 100 nm wide grooves at NA = 0.9. Liquid immersion was also successfully applied to write the master substrate from which a ROM disc can be made through injection molding. ROM discs for the recently launched Blu-ray Disc system have been successfully written with a density corresponding to 25 GB in a single layer of a 12 cm disc.

Citation Download Citation

Helmar van Santen and Jaap H. M. Neijzen "Deep-UV liquid immersion mastering of high-density optical discs", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.513463

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