Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

Theodore M. Bloomstein; Dennis E. Hardy; L. Gomez; Mordechai Rothschild

doi:10.1117/12.485469

26 June 2003 Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm

Theodore M. Bloomstein, Dennis E. Hardy, L. Gomez, Mordechai Rothschild

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485469
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

An angle-resolved scattering detection system has been designed and implemented for use at 157 nm. This tool will enable the optimization of polishing and thin-film deposition, whith an eye towards minimizing small-angle scatter in projection lithography tools. In this test-bed, scattered rays can be collected to 4° from the directional ray of the specularly transmitted beam (corresponding to spatial wavelengths of surface roughness below 2 μm) over a dynamic range of 7 orders of magnitude, and to 0.5° with a dynamic range of 5 orders of magnitude. The angular scattering distributions in CaF₂ samples and antireflective coatings are compared. From these results, the impact of scattering on image performance in exposure tools at 157 nm is estimated.

Citation Download Citation

Theodore M. Bloomstein, Dennis E. Hardy, L. Gomez, and Mordechai Rothschild "Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485469

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