Ring-opened maleic anhydride and norbornene copolymers (ROMA) have a good character resist flow process for 193-nm resist technology

Hyun-Sang Joo; Dong Chul Seo; Chang Min Kim; Young Taek Lim; Seong Duk Cho; Jong Bum Lee; Hyun Pyo Jeon; Joo Hyeon Park; Jae Chang Jung; Ki Soo Shin; Chul Kyu Bok; Seung-Chan Moon

doi:10.1117/12.485209

12 June 2003 Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Hyun-Sang Joo, Dong Chul Seo, Chang Min Kim, Young Taek Lim, Seong Duk Cho, Jong Bum Lee, Hyun Pyo Jeon, Joo Hyeon Park, Jae Chang Jung, Ki Soo Shin, Chul Kyu Bok, Seung-Chan Moon

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485209
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

We have already reported the resist using a ring opened polymer of maleic anhydride unit (ROMA). The synthesis of the ROMA polymer is as follows: 1)copolymerization of cycloolefin derivatives and maleic anhydride 2)ring opening reaction of maleic anhydride unit. 3)substitution reaction of pendant group. The ROMA Polymer has several good properties such as UV transmittance, pattern profile, PED stability and storage stability. Especially, we have been known that the resist using a ROMA polymer has a good character for application of Resist Flow Process(RFP), recently. The ROMA polymer has shown various Tg value ranging from 100°C to 170°C in accordance with substituents and substituted degree. The resist made by ROMA polymer as a matrix resin showed a good lithographic performance at direct C/H pattern. We also got a good C/H pattern profile by resist flow process at sub-100nm hole size. In this study we will discuss about it and illustrate about various Tg value of ROMA polymers and data gotten by means of resist flow process.

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Hyun-Sang Joo, Dong Chul Seo, Chang Min Kim, Young Taek Lim, Seong Duk Cho, Jong Bum Lee, Hyun Pyo Jeon, Joo Hyeon Park, Jae Chang Jung, Ki Soo Shin, Chul Kyu Bok, and Seung-Chan Moon "Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485209

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