Nanopatterning of spin-coatable TiO2 resist using an electron beam

Mohammad S.M. Saifullah; Mark E. Welland

doi:10.1117/12.485121

12 June 2003 Nanopatterning of spin-coatable TiO₂ resist using an electron beam

Mohammad S.M. Saifullah, Mark E. Welland

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485121
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Titanium dioxide has shown its potential application in solar cells, optical waveguides, gas sensors and photochromic devices. One of the hindrances for miniaturization of these devices is the lack of an easy and reliable way of patterning TiO₂. In this paper, we describe a simple process of electron beam patterning of TiO₂ using a spin-coatable TiO₂ resist prepared by reacting titanium n-butoxide with benzoylacetone in isopropyl alcohol. The sensitivity of ~115 nm thick spin-coatable TiO₂ resist is ~30 mC cm^-2, which is ~10⁷ times higher than sputtered TiO_x and crystalline TiO₂ films. Exposure to an electron beam results in the gradual removal of organic material from the resist. This makes the exposed resist insoluble in organic solvents such as acetone; thereby providing high resolution negative line patterns as small as 19 nm wide. Heating of the patterned films results in pure TiO₂.

Citation Download Citation

Mohammad S.M. Saifullah and Mark E. Welland "Nanopatterning of spin-coatable TiO₂ resist using an electron beam", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485121

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