System and process learning in a full-field high-power EUVL alpha tool

William P. Ballard; Daniel A. Tichenor; Donna J. O'Connell; Luis J. Bernardez II; Robert E. Lafon; Richard J. M. Anderson; Alvin H. Leung; Kenneth A. Williams; Steven J. Haney; Yon E. Perras; Karen L. Jefferson; Therese L. Porter; Daniel Knight; Pamela K. Barr; James L. Van de Vreugde; Richard H. Campiotti; Mark D. Zimmerman; Terry A. Johnson; Leonard E. Klebanoff; Philip A. Grunow; Samuel Graham Jr.; Dean A. Buchenauer; William C. Replogle; Tony G. Smith; John B. Wronosky; Joel R. Darnold; Kenneth L. Blaedel; Henry N. Chapman; John S. Taylor; Layton C. Hale; Gary E. Sommargren; Eric M. Gullikson; Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Harry Shields; Randall J. St. Pierre; Samuel Ponti

doi:10.1117/12.482791

16 June 2003 System and process learning in a full-field, high-power EUVL alpha tool

William P. Ballard, Daniel A. Tichenor, Donna J. O'Connell, Luis J. Bernardez II, Robert E. Lafon, Richard J. M. Anderson, Alvin H. Leung, Kenneth A. Williams, Steven J. Haney, Yon E. Perras, Karen L. Jefferson, Therese L. Porter, Daniel Knight, Pamela K. Barr, James L. Van de Vreugde, Richard H. Campiotti, Mark D. Zimmerman, Terry A. Johnson, Leonard E. Klebanoff, Philip A. Grunow, Samuel Graham Jr., Dean A. Buchenauer, William C. Replogle, Tony G. Smith, John B. Wronosky, Joel R. Darnold, Kenneth L. Blaedel, Henry N. Chapman, John S. Taylor, Layton C. Hale, Gary E. Sommargren, Eric M. Gullikson, Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Harry Shields, Randall J. St. Pierre, Samuel Ponti

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482791
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP) source, stages, sensors, and control system have been made. The LPP has been upgraded from the 40 W LPP cluster jet source used for initial demonstration of full-field imaging to a high-power (1500 W) LPP source with a liquid Xe spray jet. Scanned lithography at various laser drive powers of >500 W has been demonstrated with virtually identical lithographic performance.

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William P. Ballard, Daniel A. Tichenor, Donna J. O'Connell, Luis J. Bernardez II, Robert E. Lafon, Richard J. M. Anderson, Alvin H. Leung, Kenneth A. Williams, Steven J. Haney, Yon E. Perras, Karen L. Jefferson, Therese L. Porter, Daniel Knight, Pamela K. Barr, James L. Van de Vreugde, Richard H. Campiotti, Mark D. Zimmerman, Terry A. Johnson, Leonard E. Klebanoff, Philip A. Grunow, Samuel Graham Jr., Dean A. Buchenauer, William C. Replogle, Tony G. Smith, John B. Wronosky, Joel R. Darnold, Kenneth L. Blaedel, Henry N. Chapman, John S. Taylor, Layton C. Hale, Gary E. Sommargren, Eric M. Gullikson, Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Harry Shields, Randall J. St. Pierre, and Samuel Ponti "System and process learning in a full-field, high-power EUVL alpha tool", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482791

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