Mix and match capability of e-beam direct-write for the 65-nm technology

Yves Laplanche; Murielle Charpin; Laurent Pain; J. Todeschini; Daniel Henry; Pierre-Olivier Sassoulas; S. Gough; Ulf Weidenmueller; Peter Hahmann

doi:10.1117/12.482342

16 June 2003 Mix and match capability of e-beam direct-write for the 65-nm technology

Yves Laplanche, Murielle Charpin, Laurent Pain, J. Todeschini, Daniel Henry, Pierre-Olivier Sassoulas, S. Gough, Ulf Weidenmueller, Peter Hahmann

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.482342
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

An easy way to pattern 65nm CD target, when optical lithography technology is not available, is to use an Electron Beam Direct Write tool (EBDW), which is well known for its high resolution patterning potentials, with the drawback of a very low throughput. Emerging techniques of electron projection lithography also propose the same patterning capability with enhanced throughput. One of the most crucial issues, when dealing with integration, is the overlay capability of the systems. This paper exposes the studies made on the overlay capability issue of the LEICA EBDW installed in STMicroelectronics (STM) production plant in Crolles (France) and proves our tool is ready to support the 65nm node technology development.

Citation Download Citation

Yves Laplanche, Murielle Charpin, Laurent Pain, J. Todeschini, Daniel Henry, Pierre-Olivier Sassoulas, S. Gough, Ulf Weidenmueller, and Peter Hahmann "Mix and match capability of e-beam direct-write for the 65-nm technology", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.482342

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Semiconducting wafers

Scanners

Optical alignment

Electron beam direct write lithography

Distortion

Overlay metrology

Electron beam lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years