Paper
15 January 2003 High-aspect ratio microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching
Takanori Katoh, Yasunori Sato, Daichi Yamaguchi, Shigetoshi Ikeda, Yasushi Aoki, Ahihiro Oshima, Masakazu Washio, Yoneho Tabata
Author Affiliations +
Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.472802
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takanori Katoh, Yasunori Sato, Daichi Yamaguchi, Shigetoshi Ikeda, Yasushi Aoki, Ahihiro Oshima, Masakazu Washio, and Yoneho Tabata "High-aspect ratio microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); https://doi.org/10.1117/12.472802
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KEYWORDS
Etching

Crystals

Microfabrication

Synchrotron radiation

Fluorine

FT-IR spectroscopy

Solid state physics

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