Characterizing CaF2 for VUV optical components: roughness, surface scatter, and bulk scatter

Annette Hultaker; Nils Benkert; Stefan Gliech; Angela Duparre

doi:10.1117/12.472392

30 May 2003 Characterizing CaF₂ for VUV optical components: roughness, surface scatter, and bulk scatter

Annette Hultaker, Nils Benkert, Stefan Gliech, Angela Duparre

Proceedings Volume 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization; (2003) https://doi.org/10.1117/12.472392
Event: XXXIV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2002, Boulder, CO, United States

Abstract

Methods for evaluating the quality of CaF₂ substrates for vacuum ultraviolet (VUV) low loss optical components are presented. Today superpolished CaF₂ is available. However, major differences might still occur between batches and careful control is therefore necessary. By using roughness data from AFM measurements combined with total scattering measurements at 193 nm and 157 nm surface roughness as well as inhomogeneities in the bulk of the material can be studied. Results are also presented of anti-reflective (AR) and highly reflective (HR) multilayer coatings on CaF₂ where reduced total backscatter scattering was found for the AR-coating as compared to the substrate.

Citation Download Citation

Annette Hultaker, Nils Benkert, Stefan Gliech, and Angela Duparre "Characterizing CaF₂ for VUV optical components: roughness, surface scatter, and bulk scatter", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003); https://doi.org/10.1117/12.472392

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