Paper
5 September 2002 Development of lithography technologies
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Abstract
Optical manufacturing is very important to semiconductor, photonics and MEMS, and lithography is a core part of optical manufacturing. The development of lithography technologies, such as coating, exposure, resist and thick resist lithography, are mainly introduced.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jiang Jun "Development of lithography technologies", Proc. SPIE 4921, Optical Manufacturing Technologies, (5 September 2002); https://doi.org/10.1117/12.481731
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KEYWORDS
Lithography

Coating

Photomasks

Ion beam lithography

X-ray lithography

Ultraviolet radiation

Electron beam lithography

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