Rewritable photochromic focal plane masks

Emilio Molinari; Chiara Bertarelli; Andrea Bianco; Fabio Bortoletto; Paolo Conconi; Giuseppe Crimi; Maria Carla Gallazzi; Enrico Giro; Andrea Lucotti; Claudio Pernechele; Filippo Maria Zerbi; Giuseppe Zerbi

doi:10.1117/12.456715

30 January 2003 Rewritable photochromic focal plane masks

Emilio Molinari, Chiara Bertarelli, Andrea Bianco, Fabio Bortoletto, Paolo Conconi, Giuseppe Crimi, Maria Carla Gallazzi, Enrico Giro, Andrea Lucotti, Claudio Pernechele, Filippo Maria Zerbi, Giuseppe Zerbi

Author Affiliations +

Proceedings Volume 4842, Specialized Optical Developments in Astronomy; (2003) https://doi.org/10.1117/12.456715
Event: Astronomical Telescopes and Instrumentation, 2002, Waikoloa, Hawai'i, United States

Abstract

The application of organic photochromic materials in astronomy is opening new possibilities which we are investigating in order to design innovative devices for future instrumentation. The photochromic property of transparent/opaque transition (although in a limited wavelength range) and the changes in intrinsic refractive index have led our studies to application in astronomic spectrographs, both as focal plane mask (for MOS application) and as dispersive elements (volume phase holographic gratings, VPHG), respectively. In both cases the possibility to write and erase devices with suitable irradiation has revealed a new perspective for non-disposable and fully customizable items for spectroscopy. Pursuing this goal we have synthesized a series of novel photochromic materials belonging to the diarylethenes. They fulfill the requirements of thermal stability and fatigue resistance necessary to build functional devices. Prototypes of high contrast focal plane mask working in the H-alpha spectral region have been manufactured and characterized both in laboratory and with the AFOSC camera at Asiago telescope (1.8 m). A custom writing robot (ARATRO) which, taking imaging frames and with the aid of interactive mask design software and ad hoc control electronics, is able to write MOS masks, has been constructed. The design of the MOS masks allow the fitting in the AFOSC slit wheel. The overall set-up is ready for the sky tests.

Citation Download Citation

Emilio Molinari, Chiara Bertarelli, Andrea Bianco, Fabio Bortoletto, Paolo Conconi, Giuseppe Crimi, Maria Carla Gallazzi, Enrico Giro, Andrea Lucotti, Claudio Pernechele, Filippo Maria Zerbi, and Giuseppe Zerbi "Rewritable photochromic focal plane masks", Proc. SPIE 4842, Specialized Optical Developments in Astronomy, (30 January 2003); https://doi.org/10.1117/12.456715

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available