Paper
15 August 1984 Review Of Ultraviolet Damage Threshold Measurements At Lawrence Livermore National Laboratory
W.Howard Lowdermilk, David Milam
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Abstract
The results of damage threshold measurements made at LLNL using ultraviolet wavelength laser pulses are reviewed. Measurements were made with pulses from a krypton fluoride laser with wavelength of 248 nm and pulse duration of 20 ns and with Nd-glass laser pulses converted to the third harmonic wavelength of 355 nm with duration of 0.6 ns. Measurements are presented for transparent window materials, crystals for harmonic generation, single layer dielectric films of oxide and fluoride materials and multilayer high reflectivity and antireflective coatings.
© (1984) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
W.Howard Lowdermilk and David Milam "Review Of Ultraviolet Damage Threshold Measurements At Lawrence Livermore National Laboratory", Proc. SPIE 0476, Excimer Lasers: Their Applications & New Frontiers in Lasers, (15 August 1984); https://doi.org/10.1117/12.942584
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CITATIONS
Cited by 8 scholarly publications.
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KEYWORDS
Laser damage threshold

Magnesium fluoride

Silica

Crystals

Excimer lasers

Antireflective coatings

Laser applications

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