Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks

Eric P. Cotte; Roxann L. Engelstad; Edward G. Lovell; Daniel Tanzil; Florence O. Eschbach; Emily Y. Shu

doi:10.1117/12.476972

1 August 2002 Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks

Eric P. Cotte, Roxann L. Engelstad, Edward G. Lovell, Daniel Tanzil, Florence O. Eschbach, Emily Y. Shu

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476972
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

Lithography registration errors induced by the attachment of soft pellicles on reticles can significantly affect wafer overlay performance for sub-100 nm lithography chip manufacturing. Intel Corporation and the University of Wisconsin have conducted an extensive study to identify the various sources of pellicle-induced distortions and methods for error reduction in order to meet advanced mask manufacturing requirements. In this study, pellicle attachment processes and system materials were evaluated to determine the effects on image placement accuracy. In particular, the in-plane distortions due to the pellicle attachment technique, pellicle frame flatness, frame adhesive, and environmental temperature were characterized. At Intel, pellicles were attached to a test reticle with a 21 X 21 array of grid points. Registration measurements were conducted before and after pellicle attachment using an optical distance metrology system. A comprehensive finite element model was developed at the University of Wisconsin to assess the contributions to pellicle-induced distortions from individual components of the pellicle system. Pellicle frame flatness, frame adhesive, and temperatures were measured and used as input to the finite element model. The correlation between simulation results and experimental data was excellent. Analyses were also performed to study pellicle mounting mechanisms and pellicle frame flatness.

Citation Download Citation

Eric P. Cotte, Roxann L. Engelstad, Edward G. Lovell, Daniel Tanzil, Florence O. Eschbach, and Emily Y. Shu "Experimental and numerical studies of the effects of materials and attachment conditions on pellicle induced distortions in advanced photomasks", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476972

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available