Contrast-based assist feature optimization

Andres Torres; Yuri Granik; Luigi Capodieci

doi:10.1117/12.474537

30 July 2002 Contrast-based assist feature optimization

Andres Torres, Yuri Granik, Luigi Capodieci

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474537
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

By defining contrast as the maximum image-log-slope (ILS), we propose a novel method to optimize assist feature sites and locations. We present results that indicate that an ILS optimization at best focus provides enough information to arrive at a solution that improves the depth of focus of the design. Sub-resolution assist features (SRAF) are inserted using a rule-based approach that depends on the equivalent contrast of the original design. Later, an optical rule check (ORC) is performed to identify the regions in which the contrast of the main features is below a certain threshold. After such regions have been properly identified and selected, the neighboring edges are subjected to a sensitivity analysis that returns a contrast matrix which can be later compressed in a global contrast cost function. New positions of the assist feature edges are later evaluated and the assist features are modified accordingly. By following these steps, it is possible to alter: location, width and shape of the assist features in such a way that there is an overall improvement of the main feature contrast. A complete and integrated approach should be able to accept restrictions in the printability of assist features. In order to eliminate errors coming from the cross interactions between the globally optimized assist features and the original design, we incorporate a local clean up procedure that preserves the global validity of the current assist feature rule while improving the local behavior of the original edges. In this fashion, killer defects due to inter-rule dependencies are avoided.

Citation Download Citation

Andres Torres, Yuri Granik, and Luigi Capodieci "Contrast-based assist feature optimization", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474537

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE