Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Andrew Grenville; Vladimir Liberman; Mordechai Rothschild; Jan H. C. Sedlacek; Roger H. French; Robert C. Wheland; Xun Zhang; Joe Gordan

doi:10.1117/12.474604

30 July 2002 Behavior of candidate organic pellicle materials under 157-nm laser irradiation

Andrew Grenville, Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Roger H. French, Robert C. Wheland, Xun Zhang, Joe Gordan

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474604
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Transmission loss during irradiation remains the critical limitation for polymer pellicle materials at 157 nm. In this work we establish a framework for calculating the necessary pellicle lifetime as well as a test methodology for evaluating the laser durability of candidate polymer films. We examine the role of key extrinsic environmental variables in determining film lifetime. Oxygen concentration affects pellicle lifetime, but there is not an oxygen level that effectively balances pellicle perforation and cleaning against the onset of photochemical darkening. Neither moisture level nor 172-nm UV lamp pre-cleaning were found to have a significant impact on pellicle lifetime.

Citation Download Citation

Andrew Grenville, Vladimir Liberman, Mordechai Rothschild, Jan H. C. Sedlacek, Roger H. French, Robert C. Wheland, Xun Zhang, and Joe Gordan "Behavior of candidate organic pellicle materials under 157-nm laser irradiation", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474604

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