Characterization and acid diffusion measurements of new strong acid photoacid generators

Gregory M. Wallraff; Carl E. Larson; Nicolette Fender; Blake Davis; David R. Medeiros; Jeff Meute; William M. Lamanna; Mike J. Parent; T. Robeledo; Gregory L. Young

doi:10.1117/12.474215

24 July 2002 Characterization and acid diffusion measurements of new strong acid photoacid generators

Gregory M. Wallraff, Carl E. Larson, Nicolette Fender, Blake Davis, David R. Medeiros, Jeff Meute, William M. Lamanna, Mike J. Parent, T. Robeledo, Gregory L. Young

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474215
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

As resist feature sizes have decreased and the performance demands on chemically amplified photoresists have increased the role of the photoacid generator (PAG) in determining overall resist performance has become increasingly apparent. Over the past 20 years a variety of different types of PAG's have been introduced as researchers have sought to optimize properties such as acid strength, acid volatility, diffusion length, wavelength response, solubility etc. PAGs that produce very strong organic acids are widely used, in part because of requirements for high photospeed resists. Most of these acid generators are based on perfluoroalkyl sulfonic acid based onium salts. In an effort to identify and characterize alternative PAGs we have investigated the performance of a variety of photoacid generators that are not based on sulfonic acids. In this report we will describe the relative reactivities of these PAGs under a variety of exposure wavelengths and processing conditions including acid diffusion proprieties and photospeed measurements.

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Gregory M. Wallraff, Carl E. Larson, Nicolette Fender, Blake Davis, David R. Medeiros, Jeff Meute, William M. Lamanna, Mike J. Parent, T. Robeledo, and Gregory L. Young "Characterization and acid diffusion measurements of new strong acid photoacid generators", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474215

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