Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks

Kirk Miller; Bradley Todd; Tim Pinkerton

doi:10.1117/12.473484

16 July 2002 Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks

Kirk Miller, Bradley Todd, Tim Pinkerton

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473484
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

With the advent of alternating aperture phase shift masks it has become necessary to Monitor quartz etch depth to ensure quality mask fabrication. To date, optical tools have been primarily used for the phase metrology of these masks. Optical tools have the advantage of using actinic light, but they also have several limitations, most notably: restrictions on the minimum aperture size to be measured, prior knowledge of which aperture is etched and alack of automation. Atomic force microscopes have a long history of depth metrology and the current tip technology is small enough to extend for the next four reticle generations while new tips are being developed to meet semiconductor device roadmaps. We examine several practical issues of using an AFM based system for the phase metrology of APSM masks; matching of AFM to optical tools automation of phase measurement and an examination of the theoretical difference between AFM and optical measurements.

Citation Download Citation

Kirk Miller, Bradley Todd, and Tim Pinkerton "Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473484

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