High-power laser-plasma x-ray source for lithography

Celestino J. Gaeta; Harry Rieger; I. C. Edmond Turcu; Richard Alan Forber; Kelly L. Cassidy; S. M. Campeau; Michael F. Powers; J. R. Maldonado; James H. Morris; Richard M. Foster; Henry I. Smith; M. H. Lim

doi:10.1117/12.472353

1 July 2002 High-power laser-plasma x-ray source for lithography

Celestino J. Gaeta, Harry Rieger, I. C. Edmond Turcu, Richard Alan Forber, Kelly L. Cassidy, S. M. Campeau, Michael F. Powers, J. R. Maldonado, James H. Morris, Richard M. Foster, Henry I. Smith, M. H. Lim

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472353
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

A compact x-ray source radiates 24 Watts average power of 1nm x-rays in 2 (pi) steradians. The laser produced plasma x-ray source has a 300 W laser driver which is a compact, diode-pumped solid-state Nd:YAG laser system. The x-ray conversion efficiency is 9 percent of the laser power delivered on target. The x-ray source was used to demonstrate x-ray lithography of 75 nm lines. The x-ray source is optimized for integration with a x-ray stepper to provide a complete x-ray lithography exposure tool for the manufacture of high-speed GaAs devices.

Citation Download Citation

Celestino J. Gaeta, Harry Rieger, I. C. Edmond Turcu, Richard Alan Forber, Kelly L. Cassidy, S. M. Campeau, Michael F. Powers, J. R. Maldonado, James H. Morris, Richard M. Foster, Henry I. Smith, and M. H. Lim "High-power laser-plasma x-ray source for lithography", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472353

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