CAPELLA: a kHz and low-debris capillary discharge EUV source

Eric Robert; Thierry Gonthiez; O. Sarroukh; A. L. Thomann; Raymond Viladrosa; Claude Fleurier; Jean-Michel Pouvesle; Christophe Cachoncinlle

doi:10.1117/12.472276

1 July 2002 CAPELLA: a kHz and low-debris capillary discharge EUV source

Eric Robert, Thierry Gonthiez, O. Sarroukh, A. L. Thomann, Raymond Viladrosa, Claude Fleurier, Jean-Michel Pouvesle, Christophe Cachoncinlle

Author Affiliations +

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472276
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The development and operation of a multi watt, multi kHz and low debris EUV gas discharge source is reported. The Capillary EUV Lamp for Lithography Approach (CAPELLA) is designed and characterized for its application in the french EUV exposure tool named BEL. The burst operation at high repetition rate, up to 3 kHz, of the source during time period of a few seconds is described and shown to be relevant for the BEL application. The long time stability over hours is measured to be of 0.6 percent. Other technical BEL requirements such as energy flux, EUV output stability, spatial position stability, collection angle are briefly presented and their fulfilment is documented through the experimental data obtained on the CAPELLA prototype. An experimental characterization of debris nature and deposition rate on plasma facing silicon targets has been performed over millions of shots showing evidence of the crucial role of the discharge regime.

Citation Download Citation

Eric Robert, Thierry Gonthiez, O. Sarroukh, A. L. Thomann, Raymond Viladrosa, Claude Fleurier, Jean-Michel Pouvesle, and Christophe Cachoncinlle "CAPELLA: a kHz and low-debris capillary discharge EUV source", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472276

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