Novel design and fabrication of Si optical bench

Hyung Choi; Jin Hwan Kim; Sang-Chae Kim; Sungchul Kim; Yong Sung Kim; Byeong Cheon Koh

doi:10.1117/12.448844

19 November 2001 Novel design and fabrication of Si optical bench

Hyung Choi, Jin Hwan Kim, Sang-Chae Kim, Sungchul Kim, Yong Sung Kim, Byeong Cheon Koh

Proceedings Volume 4593, Design, Characterization, and Packaging for MEMS and Microelectronics II; (2001) https://doi.org/10.1117/12.448844
Event: International Symposium on Microelectronics and MEMS, 2001, Adelaide, Australia

Abstract

The insertion loss is highly affected by the optical path length for 2D or matrix type free space optical switch. Since the v-groove width of conventional Si optical bench is more than 25% larger than the diameter of lens, it is almost impossible to make the optical bench that has the smaller lens pitch than its diameter. In addition, owing to 'convex corner effect', the completed optical bench has the different etched pattern than expected which also makes it difficult to align the optical components. In this paper, novel design and fabrication of Si optical bench is proposed to solve these problems. We arranged the lenses meanderingly so the lens pitch could be shortened remarkably. New method to make perfect optical bench by wet etch and deep RIE process is also proposed. To compare the simulation result with the experimental one, we made the in-line type optical bench. Its maximum optical path is about 38 mm which is the same as that of the proposed 16x16 free space optical switch. From the optical simulation, the insertion loss is less than 2 dB and it agrees with the measured value within the experimental error.

Citation Download Citation

Hyung Choi, Jin Hwan Kim, Sang-Chae Kim, Sungchul Kim, Yong Sung Kim, and Byeong Cheon Koh "Novel design and fabrication of Si optical bench", Proc. SPIE 4593, Design, Characterization, and Packaging for MEMS and Microelectronics II, (19 November 2001); https://doi.org/10.1117/12.448844

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