Paper
28 September 2001 Micromachined silicon slits for beam diagnostics in particle accelerators
Elena Cianci, Andrea Notargiacomo, Alessandro Cianchi, Vittorio Foglietti
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Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001) https://doi.org/10.1117/12.442951
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Abstract
We report the fabrication process of a silicon target with a rectangular slit as an instrument for measuring the size and the angular divergence of high charge-density electron beams in particles accelerators. Bulk micromachining of silicon wafers by means of anisotropic etching allowed the definition of slits with parallel straight edges and low disuniformity. The disuniformities of the completed device evaluated by scanning electron microscopy were found to be tolerable with respect to the wavelength used in the experiments. Tests of the fabricated targets are in progress in the injector of ELETTRA, the synchrotron radiation facility in Trieste, Italy.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elena Cianci, Andrea Notargiacomo, Alessandro Cianchi, and Vittorio Foglietti "Micromachined silicon slits for beam diagnostics in particle accelerators", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); https://doi.org/10.1117/12.442951
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Cited by 6 scholarly publications.
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KEYWORDS
Silicon

Etching

Semiconducting wafers

Anisotropic etching

Particles

Photomasks

Oxides

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