Paper
28 December 2001 Plasma lens for high-flux x-ray radiation
Vyacheslav N. Shlyaptsev, Arthur Toor, Roman O. Tatchyn
Author Affiliations +
Abstract
In this work we describe new kind of refractive lens for focusing of high flux X-ray radiation of next generation X-ray sources. It is proposed to create such lens driving relatively low electric currents inside evacuated capillary made of low-Z material. The numerical simulations show that during the 0.1 - 3 microsecond(s) , 2-6 kA current pulse, the wall sustained stable capillary discharge plasma forms a concave density profile with almost parabolic index of refraction. Compared to solid materials, the plasma is able to sustain 2-3 order of magnitude larger doze ~100 eV/atom and can operate at larger fluxes and specifically in the relatively long wavelength region 1-4 keV where solid materials have dramatically larger absorption. For radiation sources similar to LCLS, the plasma lens can be placed right at the exit of undulator and deliver 3-4 orders of magnitude larger fluxes in the focal spot.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vyacheslav N. Shlyaptsev, Arthur Toor, and Roman O. Tatchyn "Plasma lens for high-flux x-ray radiation", Proc. SPIE 4500, Optics for Fourth-Generation X-Ray Sources, (28 December 2001); https://doi.org/10.1117/12.452960
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Plasma

Capillaries

X-rays

Absorption

X-ray lasers

Refraction

Solids

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