Paper
12 March 2001 Laser plasma source for highly charged ions
Nikolai E. Andreev, M. V. Chegotov
Author Affiliations +
Abstract
A production of large amount of ions with low temperature (less than 100 eV), low momentum spread and narrowed charge state distribution by petawatt-class short-pulse laser is under consideration. Residual ion energy as the least unavoidable ion energy after ionization of gases by a short intense laser pulse is calculated as a function of laser pulse parameters. Electron thermal energy coupling to the ions is estimated taking into account a multi-group structure of free electrons produced by optical field ionization.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nikolai E. Andreev and M. V. Chegotov "Laser plasma source for highly charged ions", Proc. SPIE 4352, Laser Optics 2000: Ultrafast Optics and Superstrong Laser Fields, (12 March 2001); https://doi.org/10.1117/12.418798
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KEYWORDS
Ions

Pulsed laser operation

Ionization

Plasma

Reactive ion etching

Xenon

Gases

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