Paper
9 April 2001 Improved throughput in the ALTA 3000 IC mask writing system
Gregory E. Valentin, Vishal Garg, Henry Chris Hamaker, Jay P. Daniel, Daniel R. Sprenkel
Author Affiliations +
Proceedings Volume 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2001) https://doi.org/10.1117/12.425085
Event: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2000, Munich, Germany
Abstract
The write time of an ALTA 3000HT mask writer has been observed to be up to 36% better than that of the ALTA 3000 system. The ALTA 3000HT system enables users to meet their performance requirements at increased production capacity with the use of new writing strategies. The ability to change between eight and four averaging passes, as well as the addition of key hardware improvements, gives users increased flexibility in meeting the throughput and print quality requirements for high-volume mask manufacturing. Observed throughput and print performance data, as well as benefits analysis and cost of ownership data, are presented.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregory E. Valentin, Vishal Garg, Henry Chris Hamaker, Jay P. Daniel, and Daniel R. Sprenkel "Improved throughput in the ALTA 3000 IC mask writing system", Proc. SPIE 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (9 April 2001); https://doi.org/10.1117/12.425085
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KEYWORDS
Photomasks

Printing

Mirrors

Reticles

Calibration

Composites

Bragg cells

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