Photochemical polishing of fused-silica optics by using ArF excimer laser

Masataka M. Murahara

doi:10.1117/12.425067

12 April 2001 Photochemical polishing of fused-silica optics by using ArF excimer laser

Masataka M. Murahara

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425067
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Polishing of fused silica micro optics was demonstrated without polishing dummy by using an ArF excimer laser and water solution. A fused silica glass sample was placed on the fluorocarbon grinding turntable. And the water solution was poured into a thin gap between the sample and fluorocarbon surface by capillary phenomenon. And a patterned ArF excimer laser light was irradiated on the fluorocarbon surface through the fused silica sample surface at the laser fluence of 15 mJ/cm². By this photo irradiation, the water and fluorocarbon surface were photo- dissociated and produced hydrofluoric acid locally. By the hydrofluoric acid, the silica glass surface which were contacted with the hydrofluoric acid and fluorocarbon surface was etched. As a result, the only photo irradiated part of the silica glass sample was polished effectively.

Citation Download Citation

Masataka M. Murahara "Photochemical polishing of fused-silica optics by using ArF excimer laser", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425067

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