Measurement precision of optical scatterometry

Petre-Catalin Logofatu; John Robert McNeil

doi:10.1117/12.436770

22 August 2001 Measurement precision of optical scatterometry

Petre-Catalin Logofatu, John Robert McNeil

Proceedings Volume 4344, Metrology, Inspection, and Process Control for Microlithography XV; (2001) https://doi.org/10.1117/12.436770
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

In the work reported here, we discuss the measurement precision of two scatterometry techniques, the variable angle and the variable wavelength techniques. The issue of interest is the measurement precision of the sample parameters. This is determined by both the sensitivity of the diffraction measurable to changes in sample parameters and the precision with which the measurable can be determined. This approach includes taking into account the correlation effect between the contribution to the measurable of the various grating parameters to be determined, such as linewidth and height. The comparison of the theoretical predictions of precision for angle-resolved and wavelength-resolved scatterometer measurements shows no conclusive hierarchy. Practical considerations, however, indicate that angular-resolved scatterometry is a more advantageous technique. For both methods, decreasing the wavelength of the light source improves the determination precision of the sample parameters.

Citation Download Citation

Petre-Catalin Logofatu and John Robert McNeil "Measurement precision of optical scatterometry", Proc. SPIE 4344, Metrology, Inspection, and Process Control for Microlithography XV, (22 August 2001); https://doi.org/10.1117/12.436770

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