Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system

Hideo Takino; Teruki Kobayashi; Norio Shibata; Masaaki Kuki; Akinori Itoh; Hideki Komatsuda

doi:10.1117/12.436700

20 August 2001 Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system

Hideo Takino, Teruki Kobayashi, Norio Shibata, Masaaki Kuki, Akinori Itoh, Hideki Komatsuda

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436700
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

We proposed and discussed several fabrication processes for an arc-shaped and a rectangular fly-eye mirror, used in an EUVL illumination system proposed by Komatsuda. In particular, in the present study, we focused on one process in which all elements are fabricated individually and then arranged side-by-side to from the mirror. Thus, as the first step in this process, we fabricated arc-shaped and rectangular elements; the former and the latter were made of invar and fused silica, respectively. The slope accuracies of the surfaces for the arc-shaped and the rectangular mirror elements were +/- 15 and +/- 22 seconds, respectively. These values indicate that the mirror elements were fabricated with sufficient accuracy to satisfy the fly-eye mirror specifications. Moreover, both mirrors had the midfrequency roughness of about 0.25 nm RMS which satisfies the desired specifications. However, the high- frequency roughnesses of the former and the latter were 1.08 nm RMS and 0.59 nm RMS respectively, which must be improved.

Citation Download Citation

Hideo Takino, Teruki Kobayashi, Norio Shibata, Masaaki Kuki, Akinori Itoh, and Hideki Komatsuda "Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436700

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