Optical layout of BACH: a beamline for advanced dichroism at Elettra

Marco Zangrando; Marco Finazzi; Fulvio Parmigiani; G. Paolucci; Daniele Cocco

doi:10.1117/12.406665

8 November 2000 Optical layout of BACH: a beamline for advanced dichroism at Elettra

Marco Zangrando, Marco Finazzi, Fulvio Parmigiani, G. Paolucci, Daniele Cocco

Proceedings Volume 4146, Soft X-Ray and EUV Imaging Systems; (2000) https://doi.org/10.1117/12.406665
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Here we report the general layout of the beamline and concentrate our attention on the characteristics of the optical elements as well as on the optical performances (monochromator's resolving powers and efficiencies, flux and spot dimensions) of the beamline.

Citation Download Citation

Marco Zangrando, Marco Finazzi, Fulvio Parmigiani, G. Paolucci, and Daniele Cocco "Optical layout of BACH: a beamline for advanced dichroism at Elettra", Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); https://doi.org/10.1117/12.406665

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