Si microchannel plates for image intensification

Arlynn W. Smith; Charles P. Beetz Jr.; Robert W. Boerstler; D. R. Winn; John W. Steinbeck

doi:10.1117/12.405877

3 November 2000 Si microchannel plates for image intensification

Arlynn W. Smith, Charles P. Beetz Jr., Robert W. Boerstler, D. R. Winn, John W. Steinbeck

Proceedings Volume 4128, Image Intensifiers and Applications II; (2000) https://doi.org/10.1117/12.405877
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

Glass microchannel plates (MCPs) have been in use by numerous manufactuers in a variety of electron multiplication applications. Conventional fabrication of MCPs follow the lines of glass drawing and etching technology. Core and clad glass are drawn together, stacked, drawn again, and finally stacked in the desired pattern. The soluble core is removed with wet chemical processing. These techniques are beginning to run into their feasible limits in terms of channel size, open area ratio, uniformity, and material issues. A strong desire exists to fabricate MCPs with accepted lithographic techniques using Si as the base material to improve uniformity and throughput. Open area ratios of as high as 95% have been achieved using lithography. However, attempts to meet other channel plate characteristics met with little success due to thermal runaway or arcing during operation, high voltage is required for electron gain. Processing improvements have lead to the complete oxidation of the Si matrix eliminating the conducting Si in the channel walls of the Si MCPs allowing high voltages to be supported. Complete oxidation of the Si to silica allows processing temperatures high than conventional glass matrices can withstand. This fact allows for high temperature growth of conductive and secondary emissive materials on the channel walls of the structure. Si MCPs with gain have now been fabricated and tested with voltages comparable to conventional glass MCPs. Channel plate characteristics such as operating voltage, strip current, and gain for Si MCPs will be presented and compared to glass MCPs.

Citation Download Citation

Arlynn W. Smith, Charles P. Beetz Jr., Robert W. Boerstler, D. R. Winn, and John W. Steinbeck "Si microchannel plates for image intensification", Proc. SPIE 4128, Image Intensifiers and Applications II, (3 November 2000); https://doi.org/10.1117/12.405877

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available