Paper
29 November 2000 Properties of the film electroluminescence of ZnS:TbF3
Dawei He, Qingguo Yuan, Guanghui Yu, Yongsheng Wang, Xurong Xu
Author Affiliations +
Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408414
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China
Abstract
The electroluminescence is reported from ZnS doped with terbium (Tb) thin films prepared by radio frequency magnetron sputtering method. We have systematically investigated the characteristics of the ZnS:TbF3 thin film electroluminescence devices, such as film characteristics of the ZnS/Tb active layer, substrate temperatures during magnetron sputtering and Tb concentration of the active layer, etc. From the results obtained, the mechanism of electroluminescence of thin film EL devices is discussed, and then the relationships between the EL characteristics and the device parameters are considered.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dawei He, Qingguo Yuan, Guanghui Yu, Yongsheng Wang, and Xurong Xu "Properties of the film electroluminescence of ZnS:TbF3", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408414
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KEYWORDS
Electroluminescence

Zinc

Thin film devices

Terbium

Thin films

Temperature metrology

Sputter deposition

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