Auger depth profiling of thin SiC layers: practical aspects for a better understanding of quantitative analysis

Ralf Pieterwas; Rastislav Kosiba; Gernot Ecke; Joerg Pezoldt; Hans Roessler

doi:10.1117/12.375442

25 January 2000 Auger depth profiling of thin SiC layers: practical aspects for a better understanding of quantitative analysis

Ralf Pieterwas, Rastislav Kosiba, Gernot Ecke, Joerg Pezoldt, Hans Roessler

Author Affiliations +

Proceedings Volume 4064, Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering; (2000) https://doi.org/10.1117/12.375442
Event: Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, 1999, St. Petersburg, Russian Federation

Abstract

The element sensitivity factors method and the factor analysis are the most important methods for quantification of Auger depth profiles. The present paper puts forward a criterion for the decision in which cases the use of factor analysis is necessary for the quantification. The presented criterion uses the fact, that changed chemical bonds via sample depth are connected with changed element sensitivity factors. A chosen SiC-Si sample was investigated by Target Factor Analysis. The influence of data pretreatment like data selection, normalization and filtering are discussed.

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Ralf Pieterwas, Rastislav Kosiba, Gernot Ecke, Joerg Pezoldt, and Hans Roessler "Auger depth profiling of thin SiC layers: practical aspects for a better understanding of quantitative analysis", Proc. SPIE 4064, Third International Workshop on Nondestructive Testing and Computer Simulations in Science and Engineering, (25 January 2000); https://doi.org/10.1117/12.375442

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