Self-sustaining dose control system: ways to improve the exposure process

Gregory J. Kivenzor

doi:10.1117/12.389077

5 July 2000 Self-sustaining dose control system: ways to improve the exposure process

Gregory J. Kivenzor

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389077
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

In the semiconductor equipment business, self-metrology calls for in-situ measurements and diagnostics of the process parameters. For exposure tools, self-diagnostics and self-tuning are the core features. The present paper discusses a dose control system that allows for monitoring, correction and periodic self-calibration of the litho tool. Creation of such a system becomes a task even more complex in view of the aggressive illumination environment - 193 and 157 nm - that makes most traditional optical materials inapplicable; and causes many that are applicable to have time-varying performance.

Citation Download Citation

Gregory J. Kivenzor "Self-sustaining dose control system: ways to improve the exposure process", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389077

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